Study of the structure of multilayer metallic coatings on silicon by SEM and AFM
- Authors: Gorbunov D.S., Mishkin V.P., Nishchev K.N., Novopoltsev M.I., Uskova E.N.
- Issue: Vol 2, No 19 (2014)
- Section: Статьи
- Submitted: 06.05.2025
- Accepted: 06.05.2025
- URL: https://ogarev-online.ru/2311-2468/article/view/290668
- ID: 290668
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Abstract
The structure and elemental composition of the multilayer metallic coatings used as a transition of the ohmic contact interface system structures of large power semiconductor devices have been identified by chemical etching, etching by focused ion beam, scanning electron microscopy, scanning probe microscopy. The metal coatings were deposited on the surface of the silicon structures by the magnetron sputtering technique. The results demonstrate the efficiency of the combined application of chemical and ion etching, SEM and AFM to study the structure and elemental composition of multilayer metal coatings on silicon.
About the authors
D. S. Gorbunov
Author for correspondence.
Email: ogarevonline@yandex.ru
Russian Federation
V. P. Mishkin
Email: ogarevonline@yandex.ru
Russian Federation
K. N. Nishchev
Email: ogarevonline@yandex.ru
Russian Federation
M. I. Novopoltsev
Email: ogarevonline@yandex.ru
Russian Federation
E. N. Uskova
Email: ogarevonline@yandex.ru
Russian Federation
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