Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond

S. A. Korolyov; S. A. Kraev; E. A. Arkhipova; E. V. Skorokhodov; P. A. Bushuykin; V. I. Shashkin; A. I. Okhapkin; P. A. Yunin; M. N. Drozdov

doi:10.1134/S1063782619090136

Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond

Авторлар: Korolyov S.A.¹, Kraev S.A.¹, Arkhipova E.A.¹, Skorokhodov E.V.¹, Bushuykin P.A.¹, Shashkin V.I.¹, Okhapkin A.I.¹, Yunin P.A.¹, Drozdov M.N.¹
Мекемелер:
1. Institute for Physics of Microstructures, Russian Academy of Sciences
Шығарылым: Том 53, № 9 (2019)
Беттер: 1203-1206
Бөлім: Xxiii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 11–14, 2019
URL: https://ogarev-online.ru/1063-7826/article/view/206781
DOI: https://doi.org/10.1134/S1063782619090136
ID: 206781

Дәйексөз келтіру

Толық мәтін

Ашық рұқсат
Рұқсат жабық

Рұқсат берілді
Рұқсат жабық

Тек жазылушылар үшін

Аннотация
Авторлар туралы
Әдебиет тізімі
Қосымша файлдар
Статистика

Аннотация

The plasma-chemical deposition of diamond-like carbon (DLC) films onto heavily boron-doped single-crystal p-type diamond (the concentration ~10²⁰ cm^–3) in CH₄ + Ar plasma is conducted. The deposition rate is 7 nm min^–1. The elemental composition and properties of the films are studied in detail. It is found that the films are enriched with hydrogen, possess a density of 2.4 g cm^–3, and exhibit an ultrasmooth surface (with a roughness of 0.4 ± 0.2 nm).