On the Possibility of Manufacturing Strained InAs/GaSb Superlattices by the MOCVD Method
- Авторы: Levin R.V.1, Nevedomskyi V.N.1, Bazhenov N.L.1, Zegrya G.G.1, Pushnyi B.V.1, Mizerov M.N.2
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Учреждения:
- Ioffe Institute
- Submicron Heterostructures for Microelectronics Research and Engineering Center, Russian Academy of Sciences
- Выпуск: Том 53, № 2 (2019)
- Страницы: 260-263
- Раздел: Fabrication, Treatment, and Testing of Materials and Structures
- URL: https://ogarev-online.ru/1063-7826/article/view/205774
- DOI: https://doi.org/10.1134/S1063782619020155
- ID: 205774
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Аннотация
The first results showing the possibility of manufacturing InAs/GaSb superlattices by the metal-organic chemical vapor deposition (MOCVD) method are presented. The possibility of manufacturing heterostructures with an InAs/GaSb strained superlattice with layer thicknesses of 2–4 nm is experimentally demonstrated. The 77-K electroluminescence spectra of the structures show a long-wavelength peak at around 5.0 μm (0.25 eV). This peak is probably associated with the strained superlattice because solid solutions that could form on the basis of composite compounds do not provide this carrier-recombination energy.
Об авторах
R. Levin
Ioffe Institute
Автор, ответственный за переписку.
Email: Lev@vpegroup.ioffe.ru
Россия, St. Petersburg, 194021
V. Nevedomskyi
Ioffe Institute
Email: Lev@vpegroup.ioffe.ru
Россия, St. Petersburg, 194021
N. Bazhenov
Ioffe Institute
Email: Lev@vpegroup.ioffe.ru
Россия, St. Petersburg, 194021
G. Zegrya
Ioffe Institute
Email: Lev@vpegroup.ioffe.ru
Россия, St. Petersburg, 194021
B. Pushnyi
Ioffe Institute
Email: Lev@vpegroup.ioffe.ru
Россия, St. Petersburg, 194021
M. Mizerov
Submicron Heterostructures for Microelectronics Research and Engineering Center,Russian Academy of Sciences
Email: Lev@vpegroup.ioffe.ru
Россия, St. Petersburg, 194021
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