Electrochemical Deposition of Permalloy Films for Magneto-Semiconductor Microsystems

V. V. Amelichev; S. A. Polomoshnov; N. N. Nikolaeva; R. D. Tikhonov; M. A. Kupriyanova

doi:10.1134/S1063782617130024

Electrochemical Deposition of Permalloy Films for Magneto-Semiconductor Microsystems

作者: Amelichev V.V.¹, Polomoshnov S.A.¹^,2, Nikolaeva N.N.¹, Tikhonov R.D.¹, Kupriyanova M.A.¹
隶属关系:
1. SMS “Technological Center”
2. National Research University “MIET”
期: 卷 51, 编号 13 (2017)
页面: 1707-1708
栏目: Microelectronic and Nanoelectronic Technology
URL: https://ogarev-online.ru/1063-7826/article/view/202131
DOI: https://doi.org/10.1134/S1063782617130024
ID: 202131

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The results of investigating local electrochemical deposition from a chloride electrolyte are presented. Ni₈₁Fe₁₉ permalloy films with magnetic properties similar to those of 3D samples with a uniform thickness and low mechanical stresses without high-temperature annealing are obtained. The dependences of the rate of congruent deposition of the permalloy on the current density are presented.