Technique for forming ITO films with a controlled refractive index


Дәйексөз келтіру

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Аннотация

A new method for fabricating transparent conducting coatings based on indium-tin oxide (ITO) with a controlled refractive index is proposed. This method implies the successive deposition of material by electron-beam evaporation and magnetron sputtering. Sputtered coatings with different densities (and, correspondingly, different refractive indices) can be obtained by varying the ratio of the mass fractions of material deposited by different methods. As an example, films with effective refractive indices of 1.2, 1.4, and 1.7 in the wavelength range of 440–460 nm are fabricated. Two-layer ITO coatings with controlled refractive indices of the layers are also formed by the proposed method. Thus, multilayer transparent conducting coatings with desired optical parameters can be produced.

Авторлар туралы

M. Kukushkin

Ioffe Physical–Technical Institute; ZAO EPI-CENTER

Email: l.markov@mail.ioffe.ru
Ресей, Politekhnicheskaya ul. 26, St. Petersburg, 194021; St. Petersburg, 194156

D. Zakheim

Ioffe Physical–Technical Institute

Email: l.markov@mail.ioffe.ru
Ресей, Politekhnicheskaya ul. 26, St. Petersburg, 194021

S. Pavlov

Ioffe Physical–Technical Institute

Email: l.markov@mail.ioffe.ru
Ресей, Politekhnicheskaya ul. 26, St. Petersburg, 194021

L. Markov

Ioffe Physical–Technical Institute

Хат алмасуға жауапты Автор.
Email: l.markov@mail.ioffe.ru
Ресей, Politekhnicheskaya ul. 26, St. Petersburg, 194021

I. Smirnova

Ioffe Physical–Technical Institute

Email: l.markov@mail.ioffe.ru
Ресей, Politekhnicheskaya ul. 26, St. Petersburg, 194021

A. Pavluchenko

Ioffe Physical–Technical Institute

Email: l.markov@mail.ioffe.ru
Ресей, Politekhnicheskaya ul. 26, St. Petersburg, 194021

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