The use of ALD method for deposition of Al2O3 on the surface of electrochemically activated aluminium
- Authors: Mishkin V.P., Solovyeva E.О., Tarasova O.V., Chernyaeva O.Y.
- Issue: Vol 5, No 16 (2017)
- Section: Статьи
- Submitted: 17.04.2025
- Accepted: 17.04.2025
- URL: https://ogarev-online.ru/2311-2468/article/view/288157
- ID: 288157
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Abstract
The methods of directed synthesis have been developed and the optimal conditions for the formation of structures consisting of aluminum with a given morphology and thickness have been selected. According to the data of scanning electron microscopy (SEM) and scanning probe microscopy (SPM), an ordered structure of cylindrical channels located at an angle of 45° to the substrate, as well as porous nanostructured layers with a hexagonal arrangement of pores, is formed on the Al surface, depending on the production conditions.
About the authors
V. P. Mishkin
Author for correspondence.
Email: ogarevonline@yandex.ru
E. О. Solovyeva
Email: ogarevonline@yandex.ru
O. V. Tarasova
Email: ogarevonline@yandex.ru
O. Yu. Chernyaeva
Email: ogarevonline@yandex.ru
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