Gas release in the process of thermal treatment of sputtered Pb(Ti0.48Zr0.52)Ox films
- Авторы: Znamenskii A.G.1, Ionov A.M.2, Marchenko V.A.1
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Учреждения:
- Institute of Microelectronics Technology and High-Purity Materials
- Institute of Solid State Physics
- Выпуск: Том 58, № 6 (2016)
- Страницы: 1239-1246
- Раздел: Surface Physics and Thin Films
- URL: https://ogarev-online.ru/1063-7834/article/view/197886
- DOI: https://doi.org/10.1134/S1063783416060354
- ID: 197886
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Аннотация
The conditions (regimes of deposition and thermal treatment) for gas bubble formation in ferroelectric Pb(Ti1–yZry)O3 films have been determined by thermal desorption and electron and optical micros-copy. A mechanism of bubble formation has been proposed. This mechanism rests upon the notion that lead can form oxides of the PbO2 type with a high oxygen content at relatively low temperatures and that these oxides break down with the release of oxygen to lower oxides of the PbO type upon subsequent heating. These ideas have been taken as the basis of a technique for the fabrication of Pb(Ti1–yZry)O3 films with a reduced (by an order of magnitude) density of through defects.
Об авторах
A. Znamenskii
Institute of Microelectronics Technology and High-Purity Materials
Email: marchenk@iptm.ru
Россия, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
A. Ionov
Institute of Solid State Physics
Email: marchenk@iptm.ru
Россия, ul. Akademika Osip’yana 2, Chernogolovka, Moscow oblast, 142432
V. Marchenko
Institute of Microelectronics Technology and High-Purity Materials
Автор, ответственный за переписку.
Email: marchenk@iptm.ru
Россия, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
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