Tunneling Current in Oppositely Connected Schottky Diodes Formed by Contacts between Degenerate n-GaN and a Metal
- 作者: Maiboroda I.O.1, Grishchenko J.V.1, Ezubchenko I.S.1, Sokolov I.S.1, Chernych I.A.1, Andreev A.A.1, Zanaveskin M.L.1
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隶属关系:
- National Research Center “Kurchatov Institute”
- 期: 卷 52, 编号 6 (2018)
- 页面: 776-782
- 栏目: Physics of Semiconductor Devices
- URL: https://ogarev-online.ru/1063-7826/article/view/203530
- DOI: https://doi.org/10.1134/S1063782618060131
- ID: 203530
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详细
The nonlinear behavior of the I–V characteristics of symmetric contacts between a metal and degenerate n-GaN, which form oppositely connected Schottky diodes, is investigated at free-carrier densities from 1.5 × 1019 to 2.0 × 1020 cm–3 in GaN. It is demonstrated that, at an electron density of 2.0 × 1020 cm–3, the conductivity between metal (chromium) and GaN is implemented via electron tunneling and the resistivity of the Cr–GaN contact is 0.05 Ω mm. A method for determining the parameters of potential barriers from the I–V characteristics of symmetric opposite contacts is developed. The effect of pronounced nonuniformity of the current density and voltage distributions over the contact area at low contact resistivity is taken into account. The potential-barrier height for Cr–n+-GaN contacts is found to be 0.47 ± 0.04 eV.
作者简介
I. Maiboroda
National Research Center “Kurchatov Institute”
编辑信件的主要联系方式.
Email: mrlbr@mail.ru
俄罗斯联邦, Moscow, 123182
J. Grishchenko
National Research Center “Kurchatov Institute”
Email: mrlbr@mail.ru
俄罗斯联邦, Moscow, 123182
I. Ezubchenko
National Research Center “Kurchatov Institute”
Email: mrlbr@mail.ru
俄罗斯联邦, Moscow, 123182
I. Sokolov
National Research Center “Kurchatov Institute”
Email: mrlbr@mail.ru
俄罗斯联邦, Moscow, 123182
I. Chernych
National Research Center “Kurchatov Institute”
Email: mrlbr@mail.ru
俄罗斯联邦, Moscow, 123182
A. Andreev
National Research Center “Kurchatov Institute”
Email: mrlbr@mail.ru
俄罗斯联邦, Moscow, 123182
M. Zanaveskin
National Research Center “Kurchatov Institute”
Email: mrlbr@mail.ru
俄罗斯联邦, Moscow, 123182
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