Informaçao sobre o Autor

Drozdov, M. N.

Edição Seção Título Arquivo
Volume 50, Nº 3 (2016) Semiconductor Structures, Low-Dimensional Systems, and Quantum Phenomena Epitaxially Grown Monoisotopic Si, Ge, and Si1–xGex Alloy Layers: Production and Some Properties
Volume 50, Nº 5 (2016) Spectroscopy, Interaction with Radiation Stimulated emission from a metamorphic GaAsSb bulk layer on a GaAs substrate
Volume 50, Nº 11 (2016) XX International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 14–18, 2016 Heavily doped GaAs:Te layers grown by MOVPE using diisopropyl telluride as a source
Volume 50, Nº 11 (2016) XX International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 14–18, 2016 Effect of thermal annealing on the photoluminescence of structures with InGaAs/GaAs quantum wells and a low-temperature GaAs layer δ-doped with Mn
Volume 50, Nº 11 (2016) XX International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 14–18, 2016 Epitaxial GaN layers formed on langasite substrates by the plasma-assisted MBE method
Volume 50, Nº 12 (2016) XX International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 14–18, 2016 Atomic composition and electrical characteristics of epitaxial CVD diamond layers doped with boron
Volume 51, Nº 8 (2017) Erratum Erratum to: “Atomic composition and electrical characteristics of epitaxial CVD diamond layers doped with boron”
Volume 51, Nº 11 (2017) XXI International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 13–16, 2017 Features of the selective manganese doping of GaAs structures
Volume 51, Nº 11 (2017) XXI International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 13–16, 2017 Low-temperature deposition of SiNx Films in SiH4/Ar + N2 inductively coupled plasma under high silane dilution with argon
Volume 51, Nº 12 (2017) XXI International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 13–16, 2017 Antimony segregation in Si layers grown by molecular beam epitaxy on Si wafers with different crystallographic orientations
Volume 52, Nº 11 (2018) Xxii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 12–15, 2018 Plasma Chemical Etching of Gallium Arsenide in C2F5Cl-Based Inductively Coupled Plasma
Volume 53, Nº 7 (2019) Electronic Properties of Semiconductors Influence of Annealing on the Properties of Ge:Sb/Si(001) Layers with an Antimony Concentration Above Its Equilibrium Solubility in Germanium
Volume 53, Nº 9 (2019) Xxiii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 11–14, 2019 Plasma-Chemical Deposition of Diamond-Like Films onto the Surface of Heavily Doped Single-Crystal Diamond
Volume 53, Nº 10 (2019) Xxiii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 11–14, 2019 Comparative Analysis of the Luminescence of Ge:Sb Layers Grown on Ge(001) and Si(001) Substrates
Volume 53, Nº 10 (2019) Xxiii International Symposium “Nanophysics and Nanoelectronics”, Nizhny Novgorod, March 11–14, 2019 Ohmic Contacts to CVD Diamond with Boron-Doped Delta Layers