DLTS Investigation of the Energy Spectrum of Si:Mg Crystals
- Авторы: Yarykin N.1, Shuman V.B.2, Portsel L.M.2, Lodygin A.N.2, Astrov Y.A.2, Abrosimov N.V.3, Weber J.4
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Учреждения:
- Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences
- Ioffe Institute
- Leibniz Institute for Crystal Growth
- Technische Universitat Dresden
- Выпуск: Том 53, № 6 (2019)
- Страницы: 789-794
- Раздел: Electronic Properties of Semiconductors
- URL: https://ogarev-online.ru/1063-7826/article/view/206328
- DOI: https://doi.org/10.1134/S1063782619060290
- ID: 206328
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Аннотация
Electrically active centers in n-type magnesium-doped silicon crystals are studied by deep-level transient spectroscopy (DLTS). Magnesium is introduced by diffusion from a metal film on the surface at 1100°C. It is found that two levels with a similar concentration of ~6 × 1014 cm–3 dominate in the DLTS spectrum; the value approximately corresponds to the interstitial magnesium (Mgi) concentration expected from diffusion conditions and published data on the Hall effect. The dependence of the electron emission rate from these levels on the electric-field strength agrees qualitatively with the Poole–Frenkel effect, which indicates the donor nature of both levels, although the absolute value of the effect differs from theoretical value. The activation energies of these levels found by the extrapolation of emission rates measured at various temperatures to zero field are 112 and 252 meV, which coincides within the accuracy with energies of ground states of the first and second donor levels of Mg determined previously from optical absorption. Thus, it is shown that when using high-quality initial material and the selected diffusion mode, interstitial magnesium atoms are the dominant centers with levels in the upper half of the band gap.
Об авторах
N. Yarykin
Institute of Microelectronics Technology and High Purity Materials, Russian Academy of Sciences
Email: yuri.astrov@mail.ioffe.ru
Россия, Chernogolovka, Moscow oblast, 142432
V. Shuman
Ioffe Institute
Email: yuri.astrov@mail.ioffe.ru
Россия, St. Petersburg, 194021
L. Portsel
Ioffe Institute
Email: yuri.astrov@mail.ioffe.ru
Россия, St. Petersburg, 194021
A. Lodygin
Ioffe Institute
Email: yuri.astrov@mail.ioffe.ru
Россия, St. Petersburg, 194021
Yu. Astrov
Ioffe Institute
Автор, ответственный за переписку.
Email: yuri.astrov@mail.ioffe.ru
Россия, St. Petersburg, 194021
N. Abrosimov
Leibniz Institute for Crystal Growth
Email: yuri.astrov@mail.ioffe.ru
Германия, Berlin, D-12489
J. Weber
Technische Universitat Dresden
Email: yuri.astrov@mail.ioffe.ru
Германия, Dresden, D-01062
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