X-Ray Diffraction Analysis of Features of the Crystal Structure of GaN/Al0.32Ga0.68N HEMT-Heterostructures by the Williamson–Hall Method


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The fitting of θ/2θ and ω peaks in X-ray diffraction curves is shown to be most accurate in the case of using an inverse fourth-degree polynomial or probability density function with Student’s distribution (Pearson type VII function). These functions describe well both the highest-intensity central part of the experimental peak and its low-intensity broadened base caused by X-ray diffuse scattering. The mean microdeformation ε and mean vertical domain size D are determined by the Williamson–Hall method for layers of GaN (ε ≈ 0.00006, D ≈ 200 nm) and Al0.32Ga0.68N (ε = 0.0032 ± 0.0005, D = 24 ± 7 nm). The D value obtained for the Al0.32Ga0.68N layer is most likely to result from the nominal thickness of this layer, which is 11 nm.

作者简介

S. Pushkarev

Institute of Ultrahigh-Frequency Semiconductor Electronics

编辑信件的主要联系方式.
Email: serp456207@gmail.com
俄罗斯联邦, Moscow, 117105

M. Grekhov

National Research Nuclear University MEPhI

Email: serp456207@gmail.com
俄罗斯联邦, Moscow, 115409

N. Zenchenko

Institute of Ultrahigh-Frequency Semiconductor Electronics

Email: serp456207@gmail.com
俄罗斯联邦, Moscow, 117105

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