Impurity Effects on Nucleation and Growth of SiC Clusters and Layers on Si(100) and Si(111)
- 作者: Pezoldt J.1, Lubov M.N.2, Kharlamov V.S.3
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隶属关系:
- Technische Universität Ilmenau
- St. Petersburg Academic University
- Ioffe Institute
- 期: 卷 61, 编号 12 (2019)
- 页面: 2468-2472
- 栏目: Surface Physics and Thin Films
- URL: https://ogarev-online.ru/1063-7834/article/view/207123
- DOI: https://doi.org/10.1134/S1063783419120382
- ID: 207123
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详细
A kinetic Monte Carlo model of silicon carbide growth on silicon surface is proposed. Based on this model, the growth of silicon carbide clusters on silicon in the presence of a pre-deposited impurity of various types: attractive and repulsive, is studied. The density of silicon carbide clusters on silicon is calculated. Calculations of the dependencies of the silicon carbide clusters density on the impurity mobility are carried out. The process of redistribution of the species in the multi-component C|Ge|Si structure during annealing is studied in the framework of the kinetic approach. Concentration profiles of the structure components are determined.
作者简介
J. Pezoldt
Technische Universität Ilmenau
编辑信件的主要联系方式.
Email: joerg.pezoldt@tu-ilmenau.de
德国, Ilmenau
M. Lubov
St. Petersburg Academic University
Email: joerg.pezoldt@tu-ilmenau.de
俄罗斯联邦, St. Petersburg
V. Kharlamov
Ioffe Institute
Email: joerg.pezoldt@tu-ilmenau.de
俄罗斯联邦, St. Petersburg
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