Kinetics of the electron beam induced crystallization of amorphous ZrO2 films obtained via ion-plasma and laser sputtering

Аннотация

The structure and electron beam induced crystallization kinetics of amorphous ZrO₂ films obtained via ion-plasma and laser sputtering were compared. The studies were performed by electron diffraction and transmission electron microscopy with recording video films in situ. The effect of an electron beam on an amorphous film in a vacuum was accompanied by the formation of zirconia microcrystals with an FCC lattice. For laser evaporation, the density of crystallization nuclei was β ~ 10⁹ cm^–2, and the characteristic length unit was D₀ ~ 0.48 μm. For ion-plasma evaporation, β ~ 10¹⁰ cm^–2, and D₀ ~ 0.06 μm. The kinetic curves of the crystallization of amorphous films were analyzed using the β-variant of the Kolmogorov model as a basis.