On the influence of various oxygen-containing gases on composition of trifluoromethane plasma

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Abstract

The model-based study of plasma composition in respect to neutral species in CHF 3 + O 2 , CHF 3 + СO и CHF 3 + СO 2 mixtures under the condition of inductive 13.56 MHz discharge at constant gas pressure (6 mTorr) and input power (700 W) was carried out. It was found that effects produced by additions of CO and CO 2 are sufficiently different compared with a “classical” case of CHF 3 + O 2 plasma, where an increase of plasma chemical activity as well as a rapid decrease in polymerization ability take place. The reasonability of obtained data was confirmed by the satisfactory agreement between model-predicted densities of fluorine atoms and their counterparts measured by optical emission actinometry.

About the authors

A. M. Efremov

Molecular Electronics Research Institute; Scientific Research Institute for System Analysis of the National Research Centre “Kurchatov Institute”

Email: amefremov@mail.ru
Zelenorgad, Moscow, Russia; Moscow, Russia

E. E. Koryakova

Molecular Electronics Research Institute

Zelenorgad, Moscow, Russia

V. B. Betelin

Scientific Research Institute for System Analysis of the National Research Centre “Kurchatov Institute”

Moscow, Russia

K. H. Kwon

Korea University

Chochiwon, Korea

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