MECHANISM BEHIND STRUCTURAL CHANGES ACCOMPANING THE SOLID-STATE POLYMERIZATION IN THE MOLYBDENUM-VANADIUM MIXED OXIDE FILMS

Cover Page

Cite item

Full Text

Abstract

In this paper we investigate the changes in the surface topology of inorganic polymer-derived films resulted from photostimulated polymerization. With the use of the atomic-force microscopy, the surface structure changes of mixed molybdenum-vanadium oxide thin films ( V 2 O 5: MoO 3 = 3:2) resulted from the UV light-induced polymerization was investigated. The analysis of atomic-force images evidenced that the solid-state polymerization in the mixed oxide films obtained by condensation of corresponding oxoacids occurs through 3 D mechanism. As the result of exposure, MoO 3/ V 2 O 5 films lose the intrinsic anisotropy which is due to the directional agglomeration of belt-like mixed oxide oligomers. The photopolymerization processes in the mixed oxide film yield agglomerates of nuclei built from the faceted nanometer-sized pseudocrystallites. The exposure is also accompanied with solid-state recrystallization of initially amorphous oxide resulting in the rougher relief of the exposed film. The selective acidic etching uncovers the latent structure of the film, this etching being accompanied with pseudocrystallite dispergation that results in the smoothing of the microrelief of the oxide film surface. These structural features of photosensitive mixed oxide MoO 3/ V 2 O 5 films facilitate their application as the inorganic photoresists.

About the authors

Tatyana V. Sviridova

Belarusian State University

Email: sviridova@bsu.by
Minsk, Belarus

Zlata A. Yakubovskaya

Belarusian State University

Minsk, Belarus

Vladimir B. Odzhaev

Belarusian State University

Minsk, Belarus

Dmitry V. Sviridov

Belarusian State University

Minsk, Belarus

References

  1. Liu, B. Sub-100 nm nanolithography and pattern transfer on compound semiconductor using sol-gel-derived TiO2 resist / B. Liu, S.-T. Ho. // Journal of The Electrochemical Society. - 2008. - V. 155 - № 5. - P. 57-60. doi: 10.1149/1.2883730.
  2. Chudnovskii, F.A. Metal-insulator transition in disordered VO2 / F.A. Chudnovskii, G.B. Stefanovich // Journal of Solid State Chemistry. - 1992. - V. 98. - I. 1. - P. 137-145. doi: 10.1016/0022-4596(92)90079-B.
  3. Luo, C. Review of recent advances in inorganic photoresists / C. Luo, C. Xu, L. Lv et al. // RSC Advances.- 2020. - V. 10. - I. 14. - P. 8385-8395. doi: 10.1039/C9RA08977B.
  4. Ito, E. TeOx-based film for heat-mode inorganic photoresist mastering / E. Ito, Y. Kawaguchi, M. Tomiyama et al. // Japanese journal of applied physics. - 2005. - V. 44. - № 5S. - P. 3574. doi: 10.1143/JJAP.44.3574.
  5. Van Zant, P. Microchip fabrication: a practical guide to semiconductor processing / P. Van Zant. - New York: McGraw-Hill, 1997. - 623 p.
  6. Барабошина, А.А. Неорганические фоторезисты на основе смешанных оксидов молибдена и ванадия / А.А. Барабошина, Т.В. Свиридова, Л.С. Цыбульская и др. // Доклады Национальной академии наук Беларуси. - 2015. - Т. 59. - №. 4. - С. 68-71.
  7. Sinclair, W.R. Iron oxide - an inorganic photoresist and mask material / W.R. Sinclair, D.L. Rousseau, J.J. Stancavish // Journal of The Electrochemical Society. - 1974. - V. 121. - № 7. - P. 925-928. doi: 10.1149/1.2401954.
  8. Свиридова, Т.В. Фотоиндуцированные процессы в тонких пленках MoO3 и смешанного оксида V2O5: MoO3 / Т.В. Свиридова, Л.Ю. Садовская, А.И. Кокорин и др. // Химическая физика. - 2016. - Т. 35.- №. 7. - С. 3-8. doi: 10.7868/S0207401X16070128.
  9. Sviridova, T.V. Nano- and microcrystals of molybdenum trioxide and metal-matrix composites on their basis / T.V. Sviridova, L.I. Stepanova, D.V. Sviridov // In: Molybdenum: characteristics, production and applications; ed. by M. Ortiz et al. - New York: Nova Science Publishers, 2012. - P.147-179.
  10. Livage, J. Sol-gel chemistry of transition metal oxides / J. Livage, M. Henry, C. Sanchez // Progress in Solid State Chemistry. - 1988. - V. 18. - I. 4. - P. 259-341. doi: 10.1016/0079-6786(88)90005-2.
  11. Byk, T.V. Photochemical selective deposition of nickel using a TiO2-Pd2+ layer / T.V. Byk, V.G. Sokolov, T.V. Gaevskaya et al. // Journal of Photochemistry and Photobiology A: Chemistry. - 2008. - V. 193. - I. 1.- P. 56-64. doi: 10.1016/j.jphotochem.2007.06.007.
  12. Carls, J.C. Deep ultraviolet photoresist based on tungsten polyoxometalates and poly (vinyl alcohol) for bilayer photolithography / J.C. Carls, P. Argitis, A. Heller // Journal of the Electrochemical Society. - 1992.- V. 139. - № 3. - P. 786-793. doi: 10.1149/1.2069303.
  13. Gwyddion - Free SPM (AFM, SNOM/NSOM, STM, MFM, …) data analysis software. - Режим доступа: www.url: http://gwyddion.net. - 15.08.2023.

Supplementary files

Supplementary Files
Action
1. JATS XML

Согласие на обработку персональных данных

 

Используя сайт https://journals.rcsi.science, я (далее – «Пользователь» или «Субъект персональных данных») даю согласие на обработку персональных данных на этом сайте (текст Согласия) и на обработку персональных данных с помощью сервиса «Яндекс.Метрика» (текст Согласия).