DEVELOPMENT OF PULSED LASER DEPOSITION PROCESS IN NANODIMENTIONAL STRUCTURES

Promising directions of PLD method application are presented: high-temperature superconductivity, carbon nanostructures, thermoelectric structures and topological insulators based on bismuth telluride. Vacuum physical deposition of thin films (PVD) technologies, such as pulsed laser deposition (PLD), play an important part in microelectronics and other industries. PLD has been actively developed since the 1960s, becoming a powerful tool for creating nanoscale films and high-temperature superconductors. One of the most important achievements of PLD was the production of a high-quality film of the high-temperature superconductor YBa2Cu3O7, opening up new opportunities in the field of superconductors. The PLD method has a unique combination of properties that provide high versatility and broad research potentialities. The key feature of the PLD method is the powerful (more than 1 MW/cm2) impact on the target with short (less than 30 ns) pulses. The method is based on evaporation of a target by a laser beam and deposition of the material on a substrate in a vacuum environment. A special feature of PLD is the high accuracy of control of the composition and structure of deposited materials, which makes it unique among other PVD methods. PLD is also widely used to produce carbon nanostructures, including graphene and diamond-like coatings (DLCs), which find applications in various fields, from supercapacitors to medical implants. In addition, the PLD method has been successfully applied to the formation of thin-film thermoelectric materials based on bismuth telluride, which are used in sensors and temperature stabilization systems. Wide versatility and efficiency of PLD make it a key tool in modern research and development of new materials in microelectronics, quantum technologies and energy.

pulsed laser deposition, thin films, diamond-like structures, high-temperature superconductor, film thermoelectric element, topological insulator