Deposition of 63Ni onto a Semiconductor Structure of Power Cells


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Аннотация

A procedure was developed for electrochemical deposition of 63Ni onto the surface of a siliconbased semiconductor converter. A special electrochemical cell allowing the electrolysis to be performed in an inert atmosphere was developed. The principal possibility of preparing Ni metal films of preset thickness on the surface of a semiconductor converter was demonstrated.

Авторлар туралы

I. Kharitonov

Radiochemistry Chair, Chemical Faculty

Email: ver-gv@yandex.ru
Ресей, Moscow

A. Merkushkin

Institute of Materials for Modern Power Engineering and Nanotechnology

Email: ver-gv@yandex.ru
Ресей, ul. Geroev Panfilovtsev 20, Moscow, 125480

G. Veretennikova

Institute of Materials for Modern Power Engineering and Nanotechnology

Хат алмасуға жауапты Автор.
Email: ver-gv@yandex.ru
Ресей, ul. Geroev Panfilovtsev 20, Moscow, 125480

E. Magomedbekov

Institute of Materials for Modern Power Engineering and Nanotechnology

Email: ver-gv@yandex.ru
Ресей, ul. Geroev Panfilovtsev 20, Moscow, 125480

S. Kalmykov

Radiochemistry Chair, Chemical Faculty

Email: ver-gv@yandex.ru
Ресей, Moscow

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