Author Details
Fadeev, A. V.
| Issue | Section | Title | File |
| Vol 63, No 2 (2018) | Physics of Nanostructures | Analytical Model of Atomic Layer Deposition of Films on 3D Structures with High Aspect Ratios | |
| Vol 63, No 8 (2018) | Physical Electronics | Analytical Model for Atomic-Layer Deposition of Thin Films on the Walls of Cylindrical Holes with a Relatively High Aspect Ratio | |
| Vol 63, No 10 (2018) | Physical Electronics | Atomic Layer Deposition of Thin Films onto 3D Nanostructures: The Effect of Wall Tilt Angle and Aspect Ratio of Trenches | |
| Vol 64, No 4 (2019) | Physical Electronics | Model for Thermal Oxidation of Silicon |