Cobalt Modification of Thin Rutile Films Magnetron-Sputtered in Vacuum
- Авторлар: Afonin N.N.1, Logacheva V.A.2
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Мекемелер:
- Voronezh State Pedagogical University
- Voronezh State University
- Шығарылым: Том 63, № 4 (2018)
- Беттер: 605-611
- Бөлім: Physical Electronics
- URL: https://ogarev-online.ru/1063-7842/article/view/201245
- DOI: https://doi.org/10.1134/S1063784218040023
- ID: 201245
Дәйексөз келтіру
Аннотация
Using X-ray phase analysis, atomic force microscopy, and secondary ion mass-spectrometry, the phase formation and component distribution in a Co–TiO2 film system have been investigated during magnetron sputtering of the metal on the oxide and subsequent vacuum annealing. It has been found that cobalt diffuses deep into titanium oxide to form complex oxides CoTi2O5 and CoTiO3. A mechanism behind their formation at grain boundaries throughout the thickness of the TiO2 film is suggested. It assumes the reactive diffusion of cobalt along grain boundaries in the oxide. A quantitative model of reactive interdiffusion in a bilayer polycrystalline metal–oxide film system with limited solubility of components has been developed. The individual diffusion coefficients of cobalt and titanium have been determined in the temperature interval 923–1073 K.
Авторлар туралы
N. Afonin
Voronezh State Pedagogical University
Хат алмасуға жауапты Автор.
Email: nafonin@vspu.ac.ru
Ресей, ul. Lenina 86, Voronezh, 394043
V. Logacheva
Voronezh State University
Email: nafonin@vspu.ac.ru
Ресей, Universitetskaya pl. 1, Voronezh, 394018
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