Local Anodic Oxidation of Thin GeO Films and Formation of Nanostructures Based on Them


如何引用文章

全文:

开放存取 开放存取
受限制的访问 ##reader.subscriptionAccessGranted##
受限制的访问 订阅存取

详细

The process of local anodic oxidation of thin GeO films has been studied using an atomic force microscope. The electron-probe microanalysis showed that oxidized areas of a GeO film were germanium dioxide. The effect of the voltage pulse duration applied to the probe–substrate system and the atmospheric humidity on the height of the oxide structures has been studied. The kinetics of the local anodic oxidation (LAO) in a semi-contact mode obeys the Cabrera–Mott model for large times. The initial growth rate of the oxide (R0) significantly increases and the time of starting the oxidation (t0) decreases as the atmospheric humidity increases by 20%, which is related to an increase in the concentration of oxygen-containing ions at the surface of the oxidized GeO film. It was shown that nanostructures in thin GeO layers can be formed by the LAO method.

作者简介

K. Astankova

Institute of Physics of Semiconductors

编辑信件的主要联系方式.
Email: as-tankoff@ya.ru
俄罗斯联邦, Novosibirsk, 630090

A. Kozhukhov

Institute of Physics of Semiconductors; Novosibirsk State University

Email: as-tankoff@ya.ru
俄罗斯联邦, Novosibirsk, 630090; Novosibirsk, 630090

I. Azarov

Institute of Physics of Semiconductors; Novosibirsk State University

Email: as-tankoff@ya.ru
俄罗斯联邦, Novosibirsk, 630090; Novosibirsk, 630090

E. Gorokhov

Institute of Physics of Semiconductors

Email: as-tankoff@ya.ru
俄罗斯联邦, Novosibirsk, 630090

D. Sheglov

Institute of Physics of Semiconductors

Email: as-tankoff@ya.ru
俄罗斯联邦, Novosibirsk, 630090

A. Latyshev

Institute of Physics of Semiconductors; Novosibirsk State University

Email: as-tankoff@ya.ru
俄罗斯联邦, Novosibirsk, 630090; Novosibirsk, 630090

补充文件

附件文件
动作
1. JATS XML

版权所有 © Pleiades Publishing, Ltd., 2018