Structure and properties of poly(4-methylpentene-1) track-etched membranes


Дәйексөз келтіру

Толық мәтін

Ашық рұқсат Ашық рұқсат
Рұқсат жабық Рұқсат берілді
Рұқсат жабық Тек жазылушылар үшін

Аннотация

The influence of irradiation and the subsequent etching of latent tracks in poly(4-methylpentene-1) (PMP) films on the transport parameters of the resulting membranes has been studied. The films have been irradiated with accelerated Kr and Xe ions of 4.5 and 1.2 MeV/nucleon in energy at a fluence of 106–109 cm−2. It has been found that the irradiation followed by etching makes it possible to obtain an anisotropic membrane with a nonporous selective layer between two porous layers with tapered pores. The CH4, CO2, and He transport characteristics of the membranes have been examined. It has been shown that these modification methods can significantly increase the gas flux through the membrane. It is believed that the ion track etching procedure as applied to PMP can form the basis for fabricating membranes with a highly permeable, nonporous, gas-selective layer.

Авторлар туралы

D. Syrtsova

Topchiev Institute of Petrochemical Synthesis

Хат алмасуға жауапты Автор.
Email: dasha@ips.ac.ru
Ресей, Moscow

V. Teplyakov

Topchiev Institute of Petrochemical Synthesis

Email: dasha@ips.ac.ru
Ресей, Moscow

Yu. Kochnev

Flerov Laboratory of Nuclear Reactions

Email: dasha@ips.ac.ru
Ресей, Dubna, Moscow oblast

A. Nechaev

Flerov Laboratory of Nuclear Reactions

Email: dasha@ips.ac.ru
Ресей, Dubna, Moscow oblast

P. Apel

Flerov Laboratory of Nuclear Reactions

Email: dasha@ips.ac.ru
Ресей, Dubna, Moscow oblast

O. Adeniyi

University of the Western Cape

Email: dasha@ips.ac.ru
ОАР, Cape Town

L. Petrik

University of the Western Cape

Email: dasha@ips.ac.ru
ОАР, Cape Town

Қосымша файлдар

Қосымша файлдар
Әрекет
1. JATS XML

© Pleiades Publishing, Ltd., 2016