Optical and electrical properties of thin NiO films deposited by reactive magnetron sputtering and spray pyrolysis
- Авторлар: Parkhomenko H.P.1, Solovan M.N.1, Mostovoi A.I.1, Orletskii I.G.1, Parfenyuk O.A.1, Maryanchuk P.D.1
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Мекемелер:
- Fedkovich Chernivtsi National University
- Шығарылым: Том 122, № 6 (2017)
- Беттер: 944-948
- Бөлім: Condensed-Matter Spectroscopy
- URL: https://ogarev-online.ru/0030-400X/article/view/165417
- DOI: https://doi.org/10.1134/S0030400X17060145
- ID: 165417
Дәйексөз келтіру
Аннотация
Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(λ), absorption coefficient α(λ), extinction coefficient k(λ), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.
Авторлар туралы
H. Parkhomenko
Fedkovich Chernivtsi National University
Хат алмасуға жауапты Автор.
Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012
M. Solovan
Fedkovich Chernivtsi National University
Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012
A. Mostovoi
Fedkovich Chernivtsi National University
Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012
I. Orletskii
Fedkovich Chernivtsi National University
Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012
O. Parfenyuk
Fedkovich Chernivtsi National University
Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012
P. Maryanchuk
Fedkovich Chernivtsi National University
Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012
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