Optical and electrical properties of thin NiO films deposited by reactive magnetron sputtering and spray pyrolysis


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Аннотация

Thin NiO films are deposited by reactive magnetron sputtering and spray pyrolysis. The main optical constants, i.e., refractive index n(λ), absorption coefficient α(λ), extinction coefficient k(λ), and thickness d, are determined. The temperature dependence of the resistance of thin films is found, and the activation energy of films deposited by different methods is determined.

Авторлар туралы

H. Parkhomenko

Fedkovich Chernivtsi National University

Хат алмасуға жауапты Автор.
Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012

M. Solovan

Fedkovich Chernivtsi National University

Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012

A. Mostovoi

Fedkovich Chernivtsi National University

Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012

I. Orletskii

Fedkovich Chernivtsi National University

Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012

O. Parfenyuk

Fedkovich Chernivtsi National University

Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012

P. Maryanchuk

Fedkovich Chernivtsi National University

Email: h.parkhomenko@chnu.edu.ua
Украина, Chernivtsi, 58012

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