ANNEALING-INDUCED STRUCTURAL TRANSFORMATION IN NiO THIN FILMS

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Abstract

The analysis of the results of structural studies using X-ray and electron microscopic diagnostics of NiO films obtained by magnetron sputtering is carried out. The difference in the phase and structural composition of films of different thicknesses before and after annealing is shown. The reasons for these differences are discussed, as well as the role of the interface layer for obtaining stable nanoscale NiO films on sapphire substrates.

About the authors

E. M Pashaev

National Research Center "Kurchatov Institute"

Moscow, Russia

A. P Nosov

Institute of Metal Physics, Ural Branch of the Russian Academy of Sciences

Ekaterinburg, Russia

I. A Subbotin

National Research Center "Kurchatov Institute"

Moscow, Russia

A. O Belyaeva

National Research Center "Kurchatov Institute"

Moscow, Russia

O. A Kondratev

National Research Center "Kurchatov Institute"

Moscow, Russia

S. G Nikolaeva

National Research Center "Kurchatov Institute"

Moscow, Russia

I. N Trunkin

National Research Center "Kurchatov Institute"

Moscow, Russia

A. L Vasiliev

National Research Center "Kurchatov Institute"; Moscow Institute of Physics and Technology (National Research University)

Email: a.vasiliev56@gmail.com
Moscow, Russia; Dolgoprudny, Russia

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