A High-Current Electron Gun Integrated with a Magnetron Sputtering System

P. P. Kiziridi; A. B. Markov; G. E. Ozur; A. G. Padey; E. V. Yakovlev

doi:10.1134/S0020441218020161

A High-Current Electron Gun Integrated with a Magnetron Sputtering System

作者: Kiziridi P.P.¹, Markov A.B.¹, Ozur G.E.¹, Padey A.G.¹, Yakovlev E.V.¹
隶属关系:
1. Institute of High Current Electronics, Siberian Branch
期: 卷 61, 编号 3 (2018)
页面: 433-435
栏目: Laboratory Techniques
URL: https://ogarev-online.ru/0020-4412/article/view/160254
DOI: https://doi.org/10.1134/S0020441218020161
ID: 160254

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详细

The description and the main performance specifications are presented for a device in which a high-current electron gun and a magnetron sputtering system are integrated in a common casing. This device is efficient for surface alloying on metallic materials. It is shown that the magnetic system of the magnetron does not degrade the characteristics of an electron beam that is formed in the gun and passed through a hole in the magnetron sputtering system.