An Installation for Fast and Safe Preparation of Working Mixtures in Reactors of Pulsed Chemical HF(DF) Lasers

Abstract

A system for preparing working mixtures in reactors of pulsed chemical lasers based on the F₂ + H₂(D₂) reactions is described. The design of a compact capillary mixer has been developed; its throughput of up to 2 (L atm)/s has been experimentally attained. A method for supplying gases using flow-control washers with holes operating in the critical mode is proposed. It provides a constant flow rate of mixed gases during the whole run-in. The described technology for preparing the working mixture of a pulsed chemical HF(DF) laser is theoretically analyzed and experimentally tested.