Features of focusing of a high-intensity pulsed ion beam formed by a diode with a passive anode
- Авторлар: Zhu X.P.1, Ding L.1, Zhang Q.1, Pushkarev A.I.1,2, Lei M.K.1
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Мекемелер:
- Surface Engineering Laboratory, School of Materials Science and Engineering
- Tomsk Polytechnic University
- Шығарылым: Том 60, № 4 (2017)
- Беттер: 562-569
- Бөлім: General Experimental Techniques
- URL: https://ogarev-online.ru/0020-4412/article/view/159857
- DOI: https://doi.org/10.1134/S0020441217030277
- ID: 159857
Дәйексөз келтіру
Аннотация
The results of investigating the focusing of a high-power ion beam, which is formed by a diode with a semicylindrical geometry and a passive anode, are presented. Two types of focusing diodes were investigated: with external magnetic insulation (one-pulse mode) and self-magnetic insulation of electrons (twopulse mode). Measurements of the energy-density distribution of the ion beam and the ion-current density were performed. It was found that when the diode operates in the two-pulse mode, the region of the maximum ion-beam energy density in the focal plane is displaced relative to the region of the maximum ion-current density by 5–10 mm. It is shown that the effect of a displacement of the focal spot with the maximum energy density is determined by the presence of a large number of accelerated neutral atoms in the ion beam. These atoms are produced as a result of the ion charge-exchange process in the anode–cathode gap of the ion diode during its operation in the two-pulse mode.
Авторлар туралы
X. Zhu
Surface Engineering Laboratory, School of Materials Science and Engineering
Email: aipush@mail.ru
ҚХР, Dalian, 116024
L. Ding
Surface Engineering Laboratory, School of Materials Science and Engineering
Email: aipush@mail.ru
ҚХР, Dalian, 116024
Q. Zhang
Surface Engineering Laboratory, School of Materials Science and Engineering
Email: aipush@mail.ru
ҚХР, Dalian, 116024
A. Pushkarev
Surface Engineering Laboratory, School of Materials Science and Engineering; Tomsk Polytechnic University
Хат алмасуға жауапты Автор.
Email: aipush@mail.ru
ҚХР, Dalian, 116024; Tomsk, 634050
M. Lei
Surface Engineering Laboratory, School of Materials Science and Engineering
Email: aipush@mail.ru
ҚХР, Dalian, 116024
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