Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure

M. V. Ermolenko; S. M. Zavadski; D. A. Golosov; S. N. Melnikov; E. G. Zamburg

doi:10.3103/S1068366616030065

Tribological behavior of TiN films depositid by reactive magnetron sputtering under low pressure

作者: Ermolenko M.V.¹, Zavadski S.M.¹, Golosov D.A.¹, Melnikov S.N.¹, Zamburg E.G.²
隶属关系:
1. Belarusian State University of Informatics and Radioelectronics
2. Southern Federal University
期: 卷 37, 编号 3 (2016)
页面: 289-292
栏目: Article
URL: https://ogarev-online.ru/1068-3666/article/view/228312
DOI: https://doi.org/10.3103/S1068366616030065
ID: 228312

如何引用文章

全文:

开放存取

##reader.subscriptionAccessGranted##
受限制的访问

订阅存取

详细
作者简介
参考
补充文件
统计

详细

The effect of deposition conditions on the tribological behavior of titanium nitride thin films produced by reactive magnetron sputtering has been studied. Dependences of the hardness, the width of the friction track, the friction coefficient, and the volume wear of the TiN films on the N₂ reactive gas flow rate have been obtained. Conditions of deposition under which the coatings with the best tribological characteristics are formed have been determined.