| 期 |
栏目 |
标题 |
文件 |
| 卷 59, 编号 2 (2016) |
Article |
Peculiarities of Determining the Dopant Concentration in the Near-Surface Layer of a Semiconductor by Measuring the Admittance of MIS Structures Based on P-Hg0.78Cd0.22Te Grown by Molecular Beam Epitaxy |
|
| 卷 59, 编号 7 (2016) |
Physics of Semiconductors and Dielectrics |
Temperature and Field Dependences of Parameters of the Equivalent Circuit Elements of MIS Structures Based on MBE n-Hg0.775Cd0.225Te in the Strong Inversion Mode |
|
| 卷 60, 编号 1 (2017) |
Article |
Electron Concentration in the Near-Surface Graded-Gap Layer of MBE n-Hg1–xCdxTe (x = 0.22–0.40) Determined from the Capacitance Measurements of MIS-Structures |
|
| 卷 60, 编号 2 (2017) |
Article |
Temperature Dependences of the Product of the Differential Resistance by the Area in MIS-Structures Based on CdxHg1–xTe Grown by Molecularbeam Epitaxy on Alternative Si and GaAs Substrates |
|
| 卷 60, 编号 11 (2018) |
Article |
Admittance of MIS-Structures Based on HgCdTe with a Double-Layer CdTe/Al2O3 Insulator |
|
| 卷 60, 编号 12 (2018) |
Article |
Generation of Surface Defects in Epitaxial CdxHg1–xTe Layers by Soft X-ray Radiation of Laser Plasma |
|
| 卷 61, 编号 11 (2019) |
Article |
Peculiarities of Modeling the Frequency Dependences of Admittance of MIS Structure Based on Organic P3HT Film with an Insulator Al2O3 Layer |
|
| 卷 62, 编号 1 (2019) |
Article |
Electrophysical Characteristics of the Pentacene-based MIS Structures with a SiO2 Insulator |
|
| 卷 62, 编号 2 (2019) |
Physics of Semiconductors and Dielectrics |
Admittance of Organic LED Structures with an Emission YAK-203 Layer |
|
| 卷 62, 编号 5 (2019) |
Article |
Admittance Characteristics of nBn Structures Based on Hgcdte Grown by Molecular Beam Epitaxy |
|
| 卷 62, 编号 6 (2019) |
Physics of Semiconductors and Dielectrics |
Current-Voltage Characteristics of nBn Structures Based on Mercury Cadmium Telluride Epitaxial Films |
|
