Properties of the Barium–Strontium Titanate Films Deposited onto the Silicon Substrate by rf Cathode Sputtering

Аннотация

Using rf cathode sputtering of a target in the oxygen atmosphere, Ba_0.6Sr_0.4TiO₃ solid solution thin films have been formed on the single-crystal Si(001) cut surface and their crystal structure, microstructure, and optical characteristics have been investigated. It is shown that the films are optically anisotropic, polycrystalline, and have a c axis preferred direction perpendicular to the substrate. The a and b axes in the substrate plane have no preferred direction. It has been established that, during the synthesis, a buffer layer with a thickness of about 20 nm forms between the film and substrate, which is optically equivalent to silicon oxide.