Splitting of frequencies of optical phonons in tensile-strained germanium layers
- Authors: Volodin V.A.1,2, Timofeev V.A.1, Tuktamyshev A.R.1,2, Nikiforov A.I.1
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Affiliations:
- Rzhanov Institute of Semiconductor Physics, Siberian Branch
- Novosibirsk State University
- Issue: Vol 105, No 5 (2017)
- Pages: 327-331
- Section: Condensed Matter
- URL: https://ogarev-online.ru/0021-3640/article/view/160170
- DOI: https://doi.org/10.1134/S0021364017050137
- ID: 160170
Cite item
Abstract
Tensile-strained germanium films in Ge/GeSn/Si/GeSnSi multilayer heterostructures grown by molecularbeam epitaxy on Si(001) substrates are investigated by Raman spectroscopy. Biaxial tensile strains in the films reach 1.5%, which exceeds values previously obtained for this system. Splitting of frequencies of long-wavelength optical phonons is experimentally observed; i.e., the shift of the frequency of the singlet induced by biaxial tensile strains is larger than the shift of the frequency of the doublet in agreement with calculations. The strain-induced shift of Raman scattering peaks from two-phonon scattering in germanium is also detected.
About the authors
V. A. Volodin
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Author for correspondence.
Email: volodin@isp.nsc.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630090
V. A. Timofeev
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: volodin@isp.nsc.ru
Russian Federation, Novosibirsk, 630090
A. R. Tuktamyshev
Rzhanov Institute of Semiconductor Physics, Siberian Branch; Novosibirsk State University
Email: volodin@isp.nsc.ru
Russian Federation, Novosibirsk, 630090; Novosibirsk, 630090
A. I. Nikiforov
Rzhanov Institute of Semiconductor Physics, Siberian Branch
Email: volodin@isp.nsc.ru
Russian Federation, Novosibirsk, 630090
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