Protection against degradation of the edge contour in fast-ionization dynistors
- 作者: Aristov Y.V.1, Voronkov V.B.1, Grekhov I.V.1, Korotkov D.A.1, Korotkov S.V.1, Matlashov P.E.1
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隶属关系:
- Ioffe Physical Technical Institute
- 期: 卷 60, 编号 2 (2017)
- 页面: 210-212
- 栏目: Electronics and Radio Engineering
- URL: https://ogarev-online.ru/0020-4412/article/view/159610
- DOI: https://doi.org/10.1134/S0020441217010304
- ID: 159610
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详细
The results of studying silicon semiconductor devices with nanosecond turning-on times, that is, fast-ionization dynistors (FIDs), are presented. The effect of an abrupt increase in the leakage current that flows through an FID upon blocking of the power voltage after the termination of a train of switched pulses is discovered and described. It is shown that under certain conditions this effect may result in the destruction of the FID. Methods for modifying FIDs are presented that allow stabilization of the leakage current.
作者简介
Yu. Aristov
Ioffe Physical Technical Institute
Email: Korotkov@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021
V. Voronkov
Ioffe Physical Technical Institute
Email: Korotkov@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021
I. Grekhov
Ioffe Physical Technical Institute
Email: Korotkov@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021
D. Korotkov
Ioffe Physical Technical Institute
Email: Korotkov@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021
S. Korotkov
Ioffe Physical Technical Institute
编辑信件的主要联系方式.
Email: Korotkov@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021
P. Matlashov
Ioffe Physical Technical Institute
Email: Korotkov@mail.ioffe.ru
俄罗斯联邦, ul. Politekhnicheskaya 26, St. Petersburg, 194021
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