A silicon field-effect hall sensor with an extended operating temperature range
- 作者: Leonov A.V.1, Malykh A.A.1, Mordkovich V.N.1, Pavlyuk M.I.2
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隶属关系:
- Institute of Microelectronics Technology and High Purity Materials
- JSC ICC Milandr
- 期: 卷 59, 编号 5 (2016)
- 页面: 724-727
- 栏目: General Experimental Techniques
- URL: https://ogarev-online.ru/0020-4412/article/view/159295
- DOI: https://doi.org/10.1134/S0020441216050109
- ID: 159295
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详细
The characteristics of thin-film Si MISIM magnetic transistors with a built-in accumulated channel and partially depleted quasi-neutral area are studied. The design of transistors is integrated with a Hall element. It is shown experimentally that transistors of this type, which were named field-effect Hall sensors (FEHSs) and made by the “silicon-on-insulator” (SOI) technology, provide measurements of the magnetic induction in a temperature range of 1.7–605 K. Theoretical estimates show that the upper operating temperature limit of the FEHS can be about 850 K.
作者简介
A. Leonov
Institute of Microelectronics Technology and High Purity Materials
Email: mord36@mail.ru
俄罗斯联邦, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
A. Malykh
Institute of Microelectronics Technology and High Purity Materials
Email: mord36@mail.ru
俄罗斯联邦, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
V. Mordkovich
Institute of Microelectronics Technology and High Purity Materials
编辑信件的主要联系方式.
Email: mord36@mail.ru
俄罗斯联邦, ul. Akademika Osip’yana 6, Chernogolovka, Moscow oblast, 142432
M. Pavlyuk
JSC ICC Milandr
Email: mord36@mail.ru
俄罗斯联邦, Georgievskii pr. 5, Zelenograd, Moscow, 124498
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